Fraunhofer IMS has more than 30 years of experience in the development of image sensors and operates a 200 mm CMOS production line for technologies down to a minimum structure size of 0.35 µm. Fraunhofer IMS develops semiconductor devices and processes from individual sub-steps to complete customer-specific image sensors. Due to the special combination of an in-house CMOS clean room and a microsystems technology Lab&Fab, the Fraunhofer IMS offers a wide variety of manufacturing processes for the realization of new technologies. Our extensive microelectronic expertise in semiconductors, image sensors and MEMS enables us to take innovative and compact microsystems through to pilot series production on request.