The preparation of CMOS wafers as "smart" substrates by e.g. planarization is also an important development task. On these "intelligent substrates" layers are deposited by post-CMOS processes, structured and thus new, innovative components are realized on the CMOS circuits.
In addition, the Fraunhofer IMS has been known for years for its expertise in the production of pressure sensors. The IMS develops application-specific pressure sensors for medical applications for various applications from low pressure/vacuum over the barometric pressure range up to pressures of several 10 bar. The existing know-how covers different proven technological approaches for the production of pressure sensors - integrated in or integrated on CMOS circuits. Both piezoresistive or capacitive sensor elements can be realized for the electrical detection of the quantity pressure.
Our many years of experience in the field of technology development is not only used in our own clean rooms, we also support our customers in the development of their own technologies. This ranges from the characterization of individual components to the extension of our customers' technologies with additional components or options up to the development of complete technologies in the customers' manufacturing facilities. In addition, technologies or process modules have already been transferred from Fraunhofer IMS to customers' manufacturing sites.
Details on the topic of special technology at the Fraunhofer IMS can be found in the following links.