HIESPANA "Hierarchic simulation of nanoelectronic systems for the control of process variations”"

Press Release / 31.3.2010

The approach to physical limits by changing from micro- to nanoelectronics makes the scaling of further semiconductor devices and systems more difficult.

Five cooperating Fraunhofer institutes develop and implement a hierarchic simulation approach. Along the process-, device-, circuit- and system simulation, we switch over from the nanoscopic description of a device to a macroscopic modelling of the contemplated complete system. In the context of this cooperation, the IMS provides technologic basic data and develops and produces a technically challenging demonstrator (passive UHF sensor transponder).