Optical detectors are ubiquitous today: they are found in smartphones, vehicle assistance systems, and medical devices. Manufactured industrially, they enable precise detection of individual light quanta and form the basis of many modern sensor systems. But while mass-produced products rely on high volumes and standardized designs, industry increasingly needs customized solutions.

At the Fraunhofer Institute for Microelectronic Circuits and Systems IMS, customized digital SiPMs are being developed that are specifically tailored to the requirements of modern industrial, medical, and research applications. With its new SiPM technology platform, the institute is laying the foundation for the next generation of high-precision photon detection.

»Our platform combines decades of experience in detector development with state-of-the-art 200 mm semiconductor manufacturing«, explains Dr. Jennifer Ruskowski, Head of Mobility at Fraunhofer IMS. »This enables us to manufacture digital and analog SiPMs that set new standards in sensitivity, time resolution, and robustness, while also being individually tailored to the respective application. This results in solutions that make a real difference in everything from medical technology to vehicle automation.«

One key area of application is positron emission tomography (PET), which is used to detect tumors and metastases and in Alzheimer's research. Digital SiPMs are also opening up new possibilities in cosmology, quantum technology, and biodiagnostics, in other words, wherever the weakest light signals down to individual photons need to be detected. 

Customized photon measurement with industrial quality

The technology platform developed at IMS integrates photodiodes and readout electronics (ASIC) in a close 3D structure using wafer-to-wafer bonding. Micro-through-silicon vias (µTSVs) connect the layers directly at the pixel level: a quasi-monolithic structure that enables particularly low signal losses and extremely precise timing.

This combination of scientific precision and industrial vertical integration is unique: Fraunhofer IMS operates a 200 mm CMOS production facility with quality management and automated electro-optical wafer testing. Over 1 million SiPMs have already been produced for industrial customers, with the world's lowest dark count rates of only 180 kHz/mm².

Cutting-edge technology for industrial applications

»With our platform, we make cutting-edge technology available for individual industrial applications, « adds Ruskowski. »We want to show that precise optical detection is not just something for research laboratories, but a key enabler for the industry of tomorrow.«

Further information is available here.